Apparatus for heat treating semiconductor wafers

Details Apparatus for heat treating semiconductor wafers Apparatus for heat treating semiconductor wafers

1982-05-03

1984-03-13

Reynolds, B. A.

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

219411, 219405, 219343, 219347, 2504921, F26B 330, H05B 100

Patent

active

044369859

ABSTRACT:
In the heat treating apparatus disclosed herein, a semiconductor wafer, held in a vacuum chuck, is traversed under an infrared source in which radiant energy from a linear, high intensity lamp is focused by an elongate elliptical reflector to generate a linear target zone through which the surface of the wafer is effectively scanned by the relative motion.

REFERENCES:
patent: 2325050 (1943-07-01), Goodwin
patent: 2565570 (1951-08-01), Messinger
patent: 3879164 (1975-04-01), Haldopoulos
patent: 4034186 (1977-07-01), Bestenreiner
patent: 4049947 (1977-09-01), Bestenreiner

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