Apparatus for growing vapor phase layer on semiconductor substra

Details Apparatus for growing vapor phase layer on semiconductor substra Apparatus for growing vapor phase layer on semiconductor substra

1990-08-21

1991-11-05

Chaudhuri, Olik

Chemical apparatus and process disinfecting, deodorizing, preser

Physical type apparatus

Crystallizer

29 2501, 118725, 118730, F16K 116, C23C 1652

Patent

active

050630318

ABSTRACT:
A reaction tube is fastened to a base plate by a plurality of bolts. A hollow shaft is secured to the base plate by a bearing interposed therebetween, and to be rotated by a motor. A casing secured to the shaft is arranged in the reaction tube, and has an opening closed by a susceptor on which a semiconductor substrate is to be placed. A heat-generating resistor is arranged in the casing. A thermocouple detects the temperature of the substrate. A temperature control circuit controls the temperature of the resistor by the output of the thermocouple.

REFERENCES:
patent: 4466872 (1984-08-01), Einbinder
patent: 4777022 (1988-10-01), Boldish et al.
patent: 4821674 (1989-04-01), de Boer et al.
patent: 4828224 (1989-05-01), Crabb et al.
patent: 4846102 (1989-07-01), Ozias

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