Apparatus for generating parallel beam with high flux

Optical: systems and elements – Mirror – Plural mirrors or reflecting surfaces

Reexamination Certificate

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Reexamination Certificate

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06863409

ABSTRACT:
Disclosed herein is an apparatus for generating a parallel beam with a high flux. The apparatus of the present invention includes a light source, a first mirror and a second mirror. The light source is positioned at a first focal point of a first ellipse. The first mirror is positioned on the first ellipse to reflect a beam emitted by the light source, and concavely shaped to conform to a section of the first ellipse. The second mirror is positioned across a path of the beam reflected by the first mirror, and convexly shaped to conform to a section of a second ellipse so that an angle formed by two tangent lines passing through each pair of incident points of neighboring rays incident upon the second mirror, respectively, is half of an angle formed by two tangent lines passing through each pair of incident points of neighboring rays incident upon the first mirror, respectively.

REFERENCES:
patent: 5777804 (1998-07-01), Nakamura et al.
patent: 6367954 (2002-04-01), Futami
An article entitled “Portable Parallel Beam X-Ray Diffraction System”, published by US Department of Energy, Nov. 1999.
An article entitled “Parallel Beam X-Ray Diffraction”, published by X-Ray Optical Systems Inc., 2002.
An article entitled, “Graded SIG Crystals as X-ray Collimators”, By Petrashen et al., published by Nuclear Instruments and Methods in Physics Research A, pp. 467-487, 2001.
An article entitled “Gobel Mirrors for Parallel-beam”, published by Crystallography Laboratory University of Nijmegen.

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