Coating apparatus – Gas or vapor deposition – With treating means
Patent
1995-01-11
1998-02-03
Niebling, John
Coating apparatus
Gas or vapor deposition
With treating means
118723ME, C23C 1600
Patent
active
057140090
ABSTRACT:
An apparatus and method for generating a plasma within a volume containing a mixture of gaseous species. To generate the plasma, at least one large area applicator, which is a part of this invention, is employed. At least one microwave generator introduces microwave power into the applicator by means of suitable waveguides and couplers.
REFERENCES:
patent: 4952273 (1990-08-01), Popov
patent: 4987284 (1991-01-01), Fujimura
patent: 5359177 (1994-10-01), Taki
patent: 5364519 (1994-11-01), Fujimura et al.
Chang Joni Y.
Deposition Sciences, Inc.
Niebling John
Wittenberg Malcolm B.
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