Apparatus for generating a source of plasma with high radiation

Details Apparatus for generating a source of plasma with high radiation Apparatus for generating a source of plasma with high radiation

1984-09-07

1986-06-17

Anderson, Bruce C.

X-ray or gamma ray systems or devices

Source

31511171, 376145, 378 34, 378 43, 378122, H01J 3500, G21B 100, G21K 500, G21K 700

Patent

active

045960305

ABSTRACT:
A virtually punctiform plasma source of high-intensity radiation in the X-ray region is produced at the open downstream end of a gas-filled discharge space defined by and between concentric cylindrical inner and outer electrodes. At the closed upstream end, the electrodes which define this discharge space are directly connected to a low-inductance high-power switch which serves for momentarily connecting the electrodes to a source of stored electric energy. At the closed end of the discharge space, the inner electrode is concentrically surrounded by an insulator which has a high coefficient of secondary-electron emission. In closely opposed adjacency to the insulator region of the inner electrode is an annular emission electrode which is at the potential of the outer electrode, the emission electrode being positioned at close radial offset from the insulator, and the offset being less than the mean free path in the gas of the discharge space.
A gas discharge is produced in the discharge space at a well-defined distance downstream from the emitter electrode, and the discharge in a homogeneous plasma layer, which moves toward the open downstream end of the discharge space and there forms a plasma focus of extremely high particle density and small diameter, which focus provides the plasma source of X-radiation.

REFERENCES:
patent: 3388275 (1968-06-01), Bettenhausen et al.
patent: 3946236 (1976-03-01), Roberts et al.
patent: 4042848 (1977-08-01), Lee
patent: 4368538 (1983-01-01), McCorkle

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