Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1993-06-01
1994-03-15
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041828, 356344, G01N 2726, G01N 27447
Patent
active
052943232
ABSTRACT:
In an apparatus for gel electrophoresis in which a sample of fluorophore-labelled DNA fragments is caused to migrate by electrophoresis through a gel electrolyte layer in an electrophoresis plate from top to bottom, thereby separating the sample into individual DNA fragments, and a laser beam is launched horizontally into said electrolyte layer from one side of the electrophoresis plate in a direction perpendicular to the longitudinal axis of said electrophoresis plate, with the emitted fluorescences being detected to determine the base sequences of the respective DNAS, a mirror for reflecting fluorescences is provided at the back of the electrophoresis plate in such a way that it is parallel to the direction of laser beam application, and the fluorescences reflected by this mirror are received by a fluorescence detector such as a CCD sensor or MOS linear image sensor. In one embodiment, the mirror is inclined by an angle of 45.degree. with the electrophoresis plate in such a way that it reflects the incident fluorescences upward, and the fluorescence detector is positioned above the mirror along the electrophoresis plate. In another embodiment, Texas Red having an excitation maximum wavelength of 596 nm and an emission maximum wavelength of 615 nm is used as the fluorophore and a He-Ne laser operating at a wavelength of 594 nm is used as the light source.
REFERENCES:
patent: 4874492 (1989-10-01), Mackay
patent: 5171534 (1992-12-01), Smith et al.
patent: 5192412 (1993-03-01), Kambara et al.
Biotechnology, vol. 9, Jul. 1991, "Real Time Automated Simultaneous Double-Stranded DNA Sequencing Using Two-Color Fluorophore Labeling", H. Kambara et al, pp. 648-651.
"BaseStation Automated DNA Sequence" brochure, 1991, Millipore Corporation, Bedford, Mass.
Irisawa Kazuyuki
Kambara Hideki
Togusari Teruo
Hitachi , Ltd.
Hitachi Electronics Engineering Co. Ltd.
Niebling John
Starsiak Jr. John S.
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