Apparatus for gas treatment of articles traversing an enclosure

Details Apparatus for gas treatment of articles traversing an enclosure Apparatus for gas treatment of articles traversing an enclosure

1978-01-13

1979-03-06

Yuen, Henry C.

Drying and gas or vapor contact with solids

Apparatus

For hollow article

34203, 198561, 198728, 198735, 432124, 414157, F26B 2502

Patent

active

041423046

ABSTRACT:
Treatment of articles in an enclosure traversed by gases, according to which the articles are advanced translationally and are simultaneously rotated, characterized by apparatus for causing the articles to travel the length of the enclosure several times and at different levels, and for causing the articles to roll on flat superimposed surfaces extending across the enclosure by bringing them in contact with driving components carried in a continuous or endless circuit so that the same components provide for successive travel of the articles first in one direction, and then in the other direction at two different levels.

REFERENCES:
patent: 5816 (1849-09-01), Scoville
patent: 453130 (1891-05-01), Ritscher
patent: 903620 (1908-11-01), Taliaferro
patent: 1065448 (1913-06-01), Hollstein
patent: 1322813 (1919-11-01), Parker
patent: 2087731 (1937-07-01), Klouman
patent: 2313814 (1943-03-01), Eisler
patent: 2418683 (1947-04-01), Wilson
patent: 2717548 (1955-09-01), Blair, Jr.
patent: 3111452 (1963-11-01), Ewing et al.
patent: 3277580 (1966-10-01), Tooby
patent: 3315790 (1967-04-01), Hohl
patent: 3358810 (1967-12-01), Zauner
patent: 4004701 (1977-01-01), Moses

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