Apparatus for forming thin films in quantity

Details Apparatus for forming thin films in quantity Apparatus for forming thin films in quantity

1989-03-17

1991-04-16

Morgenstern, Norman

Coating apparatus

Gas or vapor deposition

With treating means

118728, 427 39, 4272552, C23C 1650

Patent

active

050073745

ABSTRACT:
An apparatus suitable for mass-production of carbon coatings having a high degree of hardness. The apparatus utilized two types of energy input. First energy is inputted to a pair of electrodes provided in a reaction chamber, between which electrodes a deposition space is defined. A number of substrates to be coated are mounted on a plurality of substrate holders which are supplied with a second electric energy. The holders are arranged parallel to the electric field to prevent disturbance of the electric field.

REFERENCES:
patent: 4461783 (1984-07-01), Yamazaki
patent: 4582720 (1986-04-01), Yamazaki
patent: 4593644 (1986-06-01), Hanak
patent: 4723508 (1988-02-01), Yamazaki et al.
patent: 4808553 (1989-02-01), Yamazaki
patent: 4828668 (1989-05-01), Yamazaki et al.
patent: 4832981 (1989-05-01), Yamazaki

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