Apparatus for forming thin film

Details Apparatus for forming thin film Apparatus for forming thin film

1991-01-24

1992-03-31

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

118723, C23C 1422

Patent

active

051005263

ABSTRACT:
An apparatus for forming a thin film includes a vacuum chamber; an exhaust system for evacuating the vacuum chamber and a crucible for generating, in the vacuum chamber, clusters of a deposit substance. The apparatus for forming a thin film further includes an ionizing device for ionizing part of the clusters generated by the crucible; an acceleration device for accelerating ionized clusters to collide with a substrate retained in the vacuum chamber; and a filter for removing ionized clusters smaller than a predetermined size.

REFERENCES:
patent: 3847115 (1974-11-01), Tashbar
patent: 4218495 (1980-08-01), Takagi et al.
patent: 4354909 (1982-10-01), Takagi et al.
patent: 4687939 (1987-08-01), Miyauchi et al.
patent: 4805555 (1989-02-01), Itoh
patent: 4811690 (1989-03-01), Kawagoe et al.
patent: 4902572 (1990-02-01), Horne et al.

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