Apparatus for forming thin film

Details Apparatus for forming thin film Apparatus for forming thin film

1998-11-04

2000-06-27

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

118723R, 156345, C23C 1600, C23F 102

Patent

active

060793589

ABSTRACT:
An apparatus for forming a thin film comprises a housing defining a reaction chamber; a pair of electrodes securely fixed in the reaction chamber of the housing such that they are spaced from each other by a predetermined distance; and a plasma carrier detachably disposed between the pair of electrodes and having at least one substrate assembled thereto, the plasma carrier and at least one substrate cooperating with each other to delimit a glow discharge space, the plasma carrier being formed with a plurality of gas intake holes and a plurality of gas exhaust holes for communicating the glow discharge space with the outside. According to the present invention, in a plasma chemical vapor deposition device, a glow discharge space is delimited by a plasma carrier, whereby a cleansing procedure is simplified and productivity is enhanced while advantages of a box carrier type plasma chemical vapor deposition device are afforded.

REFERENCES:
patent: 5383984 (1995-01-01), Shimada et al.
patent: 5515986 (1996-05-01), Turlot et al.
patent: 5529657 (1996-06-01), Ishii
patent: 5658417 (1997-08-01), Watanabe et al.
patent: 5795452 (1998-08-01), Kinoshita et al.

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