Coating apparatus – Gas or vapor deposition – With treating means
Patent
1998-11-04
2000-06-27
Dang, Thi
Coating apparatus
Gas or vapor deposition
With treating means
118723R, 156345, C23C 1600, C23F 102
Patent
active
060793589
ABSTRACT:
An apparatus for forming a thin film comprises a housing defining a reaction chamber; a pair of electrodes securely fixed in the reaction chamber of the housing such that they are spaced from each other by a predetermined distance; and a plasma carrier detachably disposed between the pair of electrodes and having at least one substrate assembled thereto, the plasma carrier and at least one substrate cooperating with each other to delimit a glow discharge space, the plasma carrier being formed with a plurality of gas intake holes and a plurality of gas exhaust holes for communicating the glow discharge space with the outside. According to the present invention, in a plasma chemical vapor deposition device, a glow discharge space is delimited by a plasma carrier, whereby a cleansing procedure is simplified and productivity is enhanced while advantages of a box carrier type plasma chemical vapor deposition device are afforded.
REFERENCES:
patent: 5383984 (1995-01-01), Shimada et al.
patent: 5515986 (1996-05-01), Turlot et al.
patent: 5529657 (1996-06-01), Ishii
patent: 5658417 (1997-08-01), Watanabe et al.
patent: 5795452 (1998-08-01), Kinoshita et al.
Bae Sang-Soon
Kim Dae-Won
Alejandro Luz
Dang Thi
SK Corporation
LandOfFree
Apparatus for forming thin film does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for forming thin film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for forming thin film will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1775229