Apparatus for forming thin film

Details Apparatus for forming thin film Apparatus for forming thin film

1989-01-06

1991-01-08

Beck, Shrive P.

Coating apparatus

Gas or vapor deposition

With treating means

118726, 118728, 20419231, 204298, 427 38, 4272552, C23C 1650

Patent

active

049826964

ABSTRACT:
An apparatus for forming thin film includes a vacuum container to which an active gas, an inert gas, or a mixture thereof is introduced, a source of evaporation for evaporating a substance being evaporated in the vacuum container, a counter electrode disposed in the vacuum container and holding a substrate for forming a thin film thereon in such a manner as to be opposed to the source of evaporation, a grid disposed between the source of evaporation and the counter electrode and having openings which allow the substance being evaporated to pass therethrough, a filament for thermionic emission disposed between the grid and the source of evaporation and a power source device for establishing a predetermined electric potential relationship between the grid, the counter electrode, and the filament.

REFERENCES:
patent: 3583361 (1971-06-01), Laudel, Jr.
patent: 4805555 (1989-02-01), Itoh

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