Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1992-02-18
1994-03-22
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419211, C23C 1446
Patent
active
052961222
ABSTRACT:
In the manufacture of a substrate with a hydrophobic film used for a reference electrode of an ion sensor or the like, a hydrophobic film is formed on a substrate by irradiating a target consisting of a hydrophobic compound with a neutral atom beam and thereby effecting sputtering. The apparatus for effecting the sputtering comprises a target base disposed in a vacuum chamber, an atom beam gun for irradiating a target on the target base with a neutral beam, a substrate base and a shutter for controlling the passage of sputtered particles. A thin film that is manufactured is suitable for an ion sensor, such as an ISFET or the like or an enzyme sensor.
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M. Rost et al., Thin Solid Films, vol. 20, pp. S15-S19 (1974).
Katsube Teruaki
Shimomura Takeshi
Uchida Naoto
Yamaguchi Shuichiro
Teruaki Katsube
Terumo Kabushiki Kaisha
Weisstuch Aaron
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