Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to attribute – absence or presence of work
Reexamination Certificate
2011-08-09
2011-08-09
Edwards, Laura (Department: 1717)
Coating apparatus
Control means responsive to a randomly occurring sensed...
Responsive to attribute, absence or presence of work
C118S680000, C118S681000, C118S712000, C118S300000, C118S323000
Reexamination Certificate
active
07992516
ABSTRACT:
A phosphor layer forming apparatus (1) in which a paste (21) containing a phosphor is discharged so as to cover each of a plurality of light-emitting elements (11) mounted on a substrate (10) includes the following: a discharge portion (12) for discharging the paste (21) in the form of droplets onto each of the light-emitting elements (11); a measurement portion (13) for measuring the thickness of individual phosphor layers that are formed of the paste (21) covering each of the light-emitting elements (11); and a discharge control portion (14) for controlling the amount of the paste (21) to be redischarged for each phosphor layer in accordance with the thickness of the individual phosphor layers measured by the measurement portion (13). This phosphor layer forming apparatus can reduce the manufacturing time.
REFERENCES:
patent: 6511545 (2003-01-01), Banno et al.
patent: 6604971 (2003-08-01), Sun et al.
patent: 2002/0096577 (2002-07-01), Takeuchi et al.
patent: 2004/0129921 (2004-07-01), Endo et al.
patent: 2001-15817 (2001-01-01), None
patent: 2004-216210 (2004-08-01), None
patent: 2005-028223 (2005-02-01), None
Morikawa Makoto
Naito Hiroyuki
Shida Satoshi
Tanimoto Noriyasu
Ueno Yasuharu
Edwards Laura
Hamre Schumann Mueller & Larson P.C.
Panasonic Corporation
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