Coating apparatus – Gas or vapor deposition – With treating means
Patent
1992-03-23
1994-05-24
Powell, William A.
Coating apparatus
Gas or vapor deposition
With treating means
118723R, C23C 1600, C23C 1650
Patent
active
053145402
ABSTRACT:
Apparatus and process for synthesizing a diamond film of high purity at a high rate. Mixture gas of hydrocarbon gas and hydrogen gas is introduced into an arc discharge to produce a gas plasma. This gas plasma is blown against a substrate to deposit diamond. A plasma current power supply is connected with a third electrode disposed above the substrate to place the third electrode at a positive potential. An electrical current is supplied into the gas plasma from the third electrode. Flow of the electrical current through the plasma promotes the decomposition of the hydrogen and hydrocarbon. A diamond film of high purity can be deposited at a high rate. The invention is characterized in that the substrate is placed at a lower potential than the third electrode or the direction of the electrical current intersects the flow of the gas plasma although the electrical current is passed through the plasma. Therefore, it is unlikely that the accelerated electrons reach the substrate, elevating its temperature. Hence, diamond of high quality can be synthesized.
REFERENCES:
patent: 4767608 (1988-08-01), Matsumoto et al.
patent: 4830702 (1989-05-01), Singh et al.
patent: 4851254 (1989-07-01), Yamamoto et al.
patent: 5094878 (1992-03-01), Yamamoto et al.
patent: 5099788 (1992-03-01), Ito et al.
JSAP Catalog No.: AP 901110-02, 28a-ZK-6, Mar. 1990.
Hattori Tadasi
Ito Nobuei
Nakamura Satoshi
Yamamoto Minoru
Baskin Jonathan D.
Nippondenso Co. Ltd.
Powell William A.
LandOfFree
Apparatus for forming diamond film does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for forming diamond film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for forming diamond film will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1970512