Apparatus for forming deposited film including light transmissiv

Details Apparatus for forming deposited film including light transmissiv Apparatus for forming deposited film including light transmissiv

1992-12-09

1995-07-18

Kunemund, Robert

Coating apparatus

Gas or vapor deposition

With treating means

118719, 118722, 118723ER, 118723ME, C23C 1630, C23C 1650

Patent

active

054337879

ABSTRACT:
A deposited film-forming apparatus comprises a reaction chamber, a supporting member provided in the reaction chamber for holding a substrate, a plasma generating chamber adjacent to the reaction chamber with interposition of a light-transmissive perforated diffusion plate wherein at least a part of the plasma generating chamber is made of a light-transmissive member, a plasma-generation means for generating plasma in the plasma generating chamber, a first gas-introduction means for introducing a gas into the reaction chamber, a second gas-introduction means for introducing another gas into the plasma generating chamber, an evacuation means for evacuating the reaction chamber and the plasma generating chamber, and a light source provided outside the plasma generating chamber for irradiating light to the substrate held on the supporting member through the plasma generating chamber and the perforated diffusion plate, wherein the perforated diffusion plate has a light-scattering diffusion face at least at the side of the reaction chamber.

REFERENCES:
patent: 4811684 (1989-03-01), Tashiro et al.
patent: 4919077 (1990-04-01), Oda et al.
patent: 4989544 (1991-02-01), Yoshikawa
patent: 5223039 (1993-06-01), Suzuki
patent: 5304250 (1994-04-01), Sameshima et al.

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