Apparatus for forming deposited film

Coating apparatus – With vacuum or fluid pressure chamber – With means to apply electrical and/or radiant energy to work...

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118620, 118719, 118724, 118730, 427 39, C23C 1308

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active

046744347

ABSTRACT:
An apparatus for forming a deposited film comprises a chamber, which can be brought into a reduced pressure, for forming a deposited film on a substrate by introducing a starting gas into said chamber and decomposing or polymerizing said gas, the apparatus is provided with both a means for decomposing or polymerizing said gas by discharging and a means for decomposing or polymerizing said gas by heat.

REFERENCES:
patent: 4294194 (1981-10-01), Behn et al.
patent: 4526805 (1985-07-01), Yoshizawa
patent: 4539933 (1985-09-01), Campbell et al.

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