Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Patent
1978-01-17
1980-04-15
Stein, Mervin
Coating apparatus
Gas or vapor deposition
Crucible or evaporator structure
4272552, C23C 1312
Patent
active
041978145
ABSTRACT:
An apparatus for forming compound semiconductors, which has a plurality of closed type crucibles for separately holding and vaporizing the component elements of a desired compound semiconductor thin-film, the crucibles each having at least one injection nozzle, a plurality of temperature control sections for separately controlling vapor pressures inside the crucibles so that the vapors jetted from the injection nozzles of the crucibles may form clusters, a plurality of ionization chambers provided in the vicinity of the injection nozzles of the crucibles respectively for ionizing the clusters, and acceleration power supplies provided between a substrate and the ionization chambers for giving kinetic energy to the cluster ions to make them impinge on the surface of the substrate so as to form a thin film thereon.
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patent: 3926508 (1975-12-01), Harmsen et al.
patent: 4082636 (1978-04-01), Takagi
patent: 4098919 (1978-07-01), Morimoto et al.
Morimoto Kiyoshi
Takagi Toshinori
Futaba Denshi Kogyo K.K.
Stein Mervin
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