Apparatus for forming coating film for semiconductor processing

Details Apparatus for forming coating film for semiconductor processing Apparatus for forming coating film for semiconductor processing

1997-08-20

2000-01-04

Edwards, Laura

Coating apparatus

Projection or spray type

Moving projector

118302, 118305, 118669, 118671, 118683, 118696, 118712, 118600, 156578, 239104, 239106, 239112, 239 69, 222160, 222 52, 222 55, B05C 500

Patent

active

060105704

ABSTRACT:
Disclosed is an apparatus for forming a coating film for semiconductor processing, including a holder for holding a substrate, a coating solution supply device arranged to face one main surface of the substrate held by the holder and provided with a discharge port for supplying a coating solution onto the one main surface of the substrate, the coating solution forming a band-like stream having a width smaller than that of the substrate, a moving device for moving the coating solution supply device in parallel and relative to the substrate held by the holder to form a coating region and a non-coating region on the one main surface of the substrate, and a clearance retaining device for maintaining constant the distance between the discharge port of the coating solution supply device and the one main surface of the substrate.

REFERENCES:
patent: 5002008 (1991-03-01), Ushijima et al.
patent: 5094884 (1992-03-01), Hillman et al.
patent: 5119759 (1992-06-01), Hicks
patent: 5127362 (1992-07-01), Iwatsu et al.
patent: 5183508 (1993-02-01), Cholinski
patent: 5350452 (1994-09-01), Rempe et al.
patent: 5853812 (1998-12-01), Kawasaki et al.
Patent Abstracts of Japan, vol. 9, No. 308 (P-410) (2031), Dec. 4, 1985, JP 60-140350, Jul. 25, 1985.
Derwent Abstracts, AN-96-066540, JP 7-326554, Dec. 12, 1995.

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