Apparatus for forming a thin film

Details Apparatus for forming a thin film Apparatus for forming a thin film

1990-09-14

1992-05-12

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

118723, C23C 1650

Patent

active

051124661

ABSTRACT:
An apparatus for forming a thin film having a vacuum container evacuated to high vacuum and receiving a gas for vapor deposition, a generation device for generating a material vapor, a counter electrode holding a substrate to be vapor-deposited, a first grid disposed between the generation device and the electrode for accelerating the vapor, and a filament for emitting thermions to ionize the vapor. The grid and counter electrode surfaces may be curved and parallel to each other, and a second grid for accelerating the vapor, having a potential which is negative with respect to the potential of the first grid, may be placed between the first grid and the electrode, in the vicinity of the electrode, and a device may be provided for moving the first grid with respect to the electrode on a predetermined track.

REFERENCES:
patent: 3962988 (1976-06-01), Murayama et al.
patent: 4854265 (1989-08-01), Ohta et al.
patent: 4876984 (1989-10-01), Kinoshita et al.
patent: 4960072 (1990-10-01), Ohta et al.
patent: 4966095 (1990-10-01), Ohta et al.
patent: 4974544 (1990-12-01), Ohta et al.
patent: 4982696 (1991-01-01), Kinoshita et al.

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