Apparatus for forming a thin film

Details Apparatus for forming a thin film Apparatus for forming a thin film

1987-10-27

1989-02-21

Pianalto, Bernard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118 501, 118723, C23C 1600

Patent

active

048055557

ABSTRACT:
When reactive gases are directed toward a substrate disposed in a vacuum atmosphere, the reactive gases are activated by irradiation with an electron beams. The reactive gases react with vapor or cluster ions of a material to be deposited, thereby forming a thin film of the reaction products. Therefore, a thin film with high quality can be efficiently deposited on a substrate.

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