Apparatus for forming a thin film

Details Apparatus for forming a thin film Apparatus for forming a thin film

1988-06-09

1989-10-31

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118 501, 20419231, 204298, C23C 836, C23C 1432, C23C 1650

Patent

active

048769843

ABSTRACT:
An apparatus for forming a thin film having a vacuum container evacuated to high vacuum and receiving a gas for vapor deposition, a source of evaporation for evaporating a substance, a counter electrode holding a substrate to be vapor-deposited, a grid disposed between the source and the electrode for accelerating the evaporated substance, and an electronic gun for emitting thermions, which are hit on the evaporated substances to ionize them.

REFERENCES:
patent: 3583361 (1971-06-01), Laudel
patent: 4676194 (1987-06-01), Satou
patent: 4707238 (1987-11-01), Okubo
patent: 4725345 (1988-02-01), Sakamoto
Bunshah, Deposition Technologies for Films and Coatings, Noyes Publications, Park Ridge, N.J. .COPYRGT. 1982, p. 103.
Bunshah, Deposition Technologies for Films and Coatings, Noyes Publications .COPYRGT.1982, p. 258.

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