Coating apparatus – Gas or vapor deposition – With treating means
Patent
1989-08-10
1990-10-30
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
20429805, 427 38, C23C 1650
Patent
active
049660950
ABSTRACT:
An apparatus for forming a thin film comprises a vacuum container evacuated to high vacuum and receiving a gas for vapor deposition, a source of evaporation in the container for evaporating a substance, a counter electrode in the container holding a substrate to be vapor-deposited such that the substrate opposes the source, a filament disposed between the source and the electrode for generating thermions, and a grid disposed between the filament and the electrode for allowing the evaporated substance to pass therethrough and accelerating the evaporated substance. An electrical potential power supply is connected to the electrode, the filament and the grid for maintaining the grid at a positive potential with respect to the electrode and the filament, and an electrical heating power supply is connected to the grid for supplying the grid with an electrical power so as to electrically heat the grid. A cover which surrounds the source, filament, and grid and which has an opening facing the electrode may be provided in the container to enable a stable plasma and uniform thin film to be obtained regardless of any change in the shape, size, or material of the container.
REFERENCES:
patent: 4854265 (1989-08-01), Ohta et al.
patent: 4876984 (1989-10-01), Kinoshita et al.
Nakazawa Masashi
Ohta Wasaburo
Bueker Richard
Owens Terry J.
Ricoh & Company, Ltd.
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