Apparatus for forming a solid thin film from a layer of liquid m

Details Apparatus for forming a solid thin film from a layer of liquid m Apparatus for forming a solid thin film from a layer of liquid m

1997-10-16

1999-11-30

Edwards, Laura

Coating apparatus

With vacuum or fluid pressure chamber

118 52, 118 56, 118 58, 118 63, 118 69, 118319, 118320, 118620, B05C 500

Patent

active

059935464

ABSTRACT:
A solid thin film is formed from a layer of liquid material in such a manner as to fill a contact hole formed in a semiconductor structure; a semiconductor structure is firstly cooled rather than ambience, thereafter, liquid material is spread over the semiconductor structure, then the layer of liquid material is pressed so that the liquid material perfectly fills the contact hole, and, finally, the layer of liquid material is heated so as to form a solid layer from the layer of liquid material.

REFERENCES:
patent: 5395649 (1995-03-01), Ikeda
patent: 5885353 (1999-03-01), Strodtbeck et al.
Y. Shacham-Diamand, et al. "ULSI Application of Spin-On Titanium-Nitride", Oct. 28-30, 1991--pp. 43-45.

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