Apparatus for forming a semiconductor crystal

Details Apparatus for forming a semiconductor crystal Apparatus for forming a semiconductor crystal

1988-04-19

1993-09-07

Straub, Gary P.

Chemical apparatus and process disinfecting, deodorizing, preser

Physical type apparatus

Crystallizer

156611, 156612, 156DIG103, 118723, C30B 3500, C30B 2508

Patent

active

052426661

ABSTRACT:
In a semiconductor crystal growth apparatus, a cleaning chamber for cleaning the surface of a substrate is added to the structure consisting of a growth chamber and a preparation chamber. After the substrate is cleaned in the cleaning chamber, an epitaxial layer is grown on the substrate in the growth chamber. The grown epitaxial layer has an excellent crystallinity.

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patent: 4569829 (1986-02-01), Shih
patent: 4605469 (1986-08-01), Shih et al.
patent: 4806321 (1989-02-01), Nishizawa et al.
patent: 4824518 (1989-04-01), Hayakawa et al.
patent: 4834831 (1989-05-01), Nishizawa et al.
Patent Abstracts of Japan, vol. 11, No. 122 (E-500) [2569], Apr. 16, 1987, Hitachi Ltd.

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