Apparatus for forming a resist pattern

Details Apparatus for forming a resist pattern Apparatus for forming a resist pattern

1986-07-11

1989-01-24

Paschall, M. H.

Electric heating

Metal heating

By arc

2191214, 156646, 156345, 430313, 430330, 2041921, B23K 900, B44C 122

Patent

active

048002518

ABSTRACT:
A hot plate and temperature-holding plate are set in a vacuum chamber. A blank mask is taken into the vacuum chamber through an inlet port. The blank mask is placed on the hot plate. The interior pressure of vacuum chamber is reduced to a level ranging between 0.1 torr and 0.9 torr. Under this condition the blank mask is baked at a temperature of 100.degree. C..+-.5.degree. C. for 3 minutes. After the baking is brought to an end, the blank mask is carried by walking beams from the surface of the hot block to the surface of the temperature-holding plate. The blank mask is cooled to approximately room temperature on the temperature-holding plate. When the blank mask reaches the predetermined temperature level, a plasma is generated by a high frequency power source between the electrode plate, set above the blank mask and temperature-holding block, for the predetermined length of time, thereby descumming the blank mask.

REFERENCES:
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patent: 4657618 (1987-04-01), Spencer et al.
patent: 4693777 (1987-09-01), Hazano et al.
patent: 4699689 (1987-10-01), Bersin
Japanese Patent Disclosure (KOKAI) No. 57-66642, "Plasma Etching Machine" Mitsubishi Electric Co.

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