Apparatus for forming a polishing pad having a reduced...

Agitating – By injecting gas into mixing chamber – With stirrer

Reexamination Certificate

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Details

C366S137000

Reexamination Certificate

active

10956844

ABSTRACT:
The present invention provides an apparatus20for forming a striation-reduced chemical mechanical polishing pad4. The polishing pad4comprises a first delivery line66for delivering a polymeric material52into a mixer68and a second delivery line44for delivering microspheres48into the mixer68with the polymeric material52. The second delivery line44is connected to a bulk density control unit21. The bulk density control unit21comprises a storage hopper22for storing the microspheres48. The storage hopper22further comprises a porous membrane24provided over a plenum26. A fluidizing gas source23is connected to the plenum26through a gas inlet line27. Gas28fed into the plenum26from the fluidizing gas source23permeates through the porous membrane24and reduces the initial bulk density of the microspheres48in the storage hopper22.

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