Coating apparatus – Gas or vapor deposition – With treating means
Patent
1989-10-20
1991-01-01
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118724, C23C 1600, C23C 1646, C23C 1652
Patent
active
049811037
ABSTRACT:
In an apparatus for forming an aluminum thin film, or an aluminum alloy thin film useful to an interconnecting material of an electronic device, there are provided: a processing chamber capable of keeping a vacuum condition therein; a substrate holder mounted within said processing chamber, for holding a substrate and performing a temperature adjustment; a first temperature adjusting mechanism for performing the temperature adjustment of said substrate via said substrate holder whereby a part of element consisting said predetermined gas is deposited on the surface of said substrate; a gas conducting mechanism for conducting a predetermined gas into said processing chamber; an exhausting mechanism for exhausting an interior of said processing chamber; a distributing plate provided within said processing chamber, for uniformly supplying said predetermined gas to a surface of said substrate; and a second temperature adjusting mechanism for adjusting the temperature of said distributing plate.
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Kobayashi Tsukasa
Sekiguchi Atsushi
Takagi Shinji
Anelva Corporation
Bueker Richard
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