Apparatus for forming a diamond-like thin film

Details Apparatus for forming a diamond-like thin film Apparatus for forming a diamond-like thin film

1993-02-10

1995-01-03

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723ER, 118723IR, 117929, C23C 1626

Patent

active

053782852

ABSTRACT:
A diamond-like thin film of good quality is prepared homogeneously and fast in a deposition. A mesh-like acceleration electrode is provided at the opening of a chamber including a filament, and a plasma is generated in the chamber. Because the chamber is isolated electrically from the electric system of the apparatus, the high density and the equilibrium state are maintained, and the plasma density and the potential are homogenized around the mesh-like electrode. In this state, a bias potential is applied to the substrate, and the ions are accelerated according to the potential difference between the plasma and the substrate to deposit a diamond-like thin film on the substrate. Preferably, a negative potential electrode is provided before or around the substrate. Further, an insulating member is provided to surround a flight path of ions between the chamber and the substrate.

REFERENCES:
patent: 5058527 (1991-10-01), Ohta et al.
Catherine, "Preparation Techniques for Diamond-like Carbon", from Diamond and Diamond-like Films and Coatings, pp. 193-227 (1991).
Freeman, "The epitaxial synthesis of diamond by the deposition of low energy carbon ions", vacuum, vol. 34, No. 1-2, pp. 305-314 (1984).
Okada et al., Proceeding of 36th Meeting of Applied Physics 1p-H-14; published Apr. 1, 1989.

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