Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1991-05-28
1992-09-22
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Multizone chamber
118723, 118725, C23C 1648, C23C 1650
Patent
active
051493756
ABSTRACT:
An apparatus for forming a deposited film of large area comprised of a plurality of constituents, in which two film-forming raw material gases are respectively activated by a decomposing energy in respective activation chambers. The thus activated gases are introduced respectively for mixing via respective gas introducing ports into a film-forming chamber wherein the activated gases are caused to react with each other near the surface of a substrate disposed in the film-forming chamber, thereby forming said deposited film on the substrate. Each of the gas introducing ports has a rectangular or elliptic shape with the length of the longer axis being at least twice that of the shorter axis, and the gas introducing ports are disposed in parallel with each other at a distance less than the length of the shorter axis thereof. A rod-like microwave transmission antenna, a filament made of a metallic material capable of exhibiting a catalytic effect or a pair of plate-like electrodes for generating RF electric field are disposed in each of the activation chambers as the means for generating the decomposing energy.
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Bueker Richard
Canon Kabushiki Kaisha
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