Apparatus for forming a deposited film

Details Apparatus for forming a deposited film Apparatus for forming a deposited film

1991-02-06

1992-10-13

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118723, 118724, 118 501, 4272552, 427578, C23C 1600

Patent

active

051541351

ABSTRACT:
An apparatus for forming a deposited film comprises a deposition chamber holding a carrier therein, a halogen radical-introducing tube for introducing into said chamber a radical containing at least halogen atoms and a hydrogen radical-introducing tube for introducing into said chamber a radical containing hydrogen atoms, the halogen radical-introducing tube and the hydrogen radical-introducing tube each having an angle of 40.degree. to 50.degree. to the surface of said carrier, and a deposited film is formed on said carrier from said radicals.

REFERENCES:
patent: 3366090 (1968-01-01), Hough
patent: 4123244 (1978-10-01), Leclercq et al.
patent: 4138306 (1979-02-01), Niwa
patent: 4262631 (1981-04-01), Kubacki
patent: 4469715 (1984-09-01), Madan
patent: 4485121 (1984-11-01), Matsumura
patent: 4521447 (1985-06-01), Ovshinsky
patent: 4522663 (1985-06-01), Ovshinsky et al.
patent: 4522674 (1985-06-01), Ninomiya
Websters New Collegiate Dictionary, .COPYRGT.1975, G & C Merriam Co., p. 1181.
Brodsky, IBM TDB, vol. 22, No. 8A, Jan. 1980, pp. 3391-3392.

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