Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...
Patent
1996-09-11
1998-12-01
Beck, Shrive
Coating apparatus
Gas or vapor deposition
Having means to expose a portion of a substrate to coating...
118504, 427282, 427585, C23C 1604
Patent
active
058432353
ABSTRACT:
A substrate holder and mask system for depositing curved films and mirrors on flat mirror substrates. A spherical mask is held in close proximity to a substrate by a support structure to intercept a fraction of vapor from a distant source. The film deposited on the substrate behind the mask has a spherically symmetric curvature when the source has a large area. The cross section of the mask support structure is made as small as possible to minimize irregularities in the spherical figure. A mirror is subsequently deposited on said curved substrate after removing said mask.
REFERENCES:
patent: 4506185 (1985-03-01), Giler et al.
patent: 4557798 (1985-12-01), Blanding et al.
Bergman Clark
Crook Thomas M.
Beck Shrive
Honeywell Inc.
Kau Albert K.
Parker Fred J.
Rendos Thomas A.
LandOfFree
Apparatus for forming a deposited curver coating on a substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for forming a deposited curver coating on a substrate , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for forming a deposited curver coating on a substrate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2392560