Coating apparatus – With means to centrifuge work
Patent
1990-02-20
1992-03-31
Fisher, Richard V.
Coating apparatus
With means to centrifuge work
118 56, 118100, 118323, B05C 1102
Patent
active
050997823
ABSTRACT:
A relatively large-sized square substrate for use in the production of a color filter for liquid crystal display, a color image sensor or the like is applied with a coating film of a viscous liquid such as a photosensitive resin. For producing the coating film, the substrate is placed with its surface extending horizontally and the viscous liquid is dropped on the surface in a line along an edge portion of the surface. Then, a squeezee rod is moved along the surface with a predetermined gap maintained between the squeezee rod and the surface, to spread the viscous liquid over at least a part of the surface, whereby a predetermined thickness of the spread viscous liquid is obtained. Thereafter, the substrate is spinned in the plane of the surface thereof to disperse the spread viscous liquid uniformly by centrifugal force over the entire surface of the substrate, whereby a thin coating of the liquid of a uniform thickness is formed on the surface of the substrate.
REFERENCES:
patent: 3219473 (1964-12-01), Dimond
patent: 3791342 (1974-02-01), Boyer
patent: 3941901 (1976-03-01), Harsch
patent: 4315705 (1982-02-01), Flint
patent: 4674521 (1987-06-01), Paulfus
patent: 4865874 (1989-09-01), Capriotti et al.
patent: 4875434 (1989-10-01), Maejima
Iida Mitsuru
Matsuo Souichi
Nadamoto Nobunari
Nakazawa Shigeyasu
Dai Nippon Insatsu Kabushiki Kaisha
Fisher Richard V.
Lamb Brenda
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