Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1985-05-21
1986-05-06
Demers, Arthur P.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118 501, 118620, 118715, 118718, 118719, 118720, 118728, 156345, 156643, 156646, 204192R, 204192E, 406 12, 406 86, 406 88, 406 98, C23C 1500
Patent
active
045870020
ABSTRACT:
Improved apparatus (10), including passage (22) for inter-cushion processing and transport of substrates (12) towards and from process modules (14) and (16) for main processing of said substrates (12) at non-atmospheric pressure in a series of successive process chambers (64), located in between successive processors/transporters (66), in which secondary processing and transport of said substrates (12) take place.
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Forslund, IBM Tech. Disc. Bull., 13 (1970) pp. 39-40.
Demers Arthur P.
Olsen Warren E.
Semmes David H.
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