Apparatus for filling pressure vessels with gases, particularly

Details Apparatus for filling pressure vessels with gases, particularly Apparatus for filling pressure vessels with gases, particularly

1990-06-21

1992-08-18

Cusick, Ernest G.

Fluent material handling, with receiver or receiver coacting mea

Filling or refilling of dispensers

141237, 141 3, B65B 104

Patent

active

051390574

ABSTRACT:
A plurality of pressure vessels are filled with acetylene gas by an apparatus which has a gas delivery conduit with a plurality of delivery connections. A drive mechanism moves pressure vessel supports from a loading station to locations where each pressure vessel is located at and conducted to a respective gas delivery connection. The gas delivery conduit is stationary, but its mountings permit horizontal movement to avoid damage to the apparatus if the supports are accidentally moved when the pressure vessels are attached to the delivery connections. When the gas delivery conduit is displaced more than a certain amount from its normal stationary position, power to the drive mechanism is automatically cut off. The supports for the pressure vessels are oriented to house the pressure vessels at an inclination which maintains them steady. The disclosed drive mechanism has two pneumatic cylinders for driving the supports along a slide of a fixed structure.

REFERENCES:
patent: 1949536 (1934-03-01), Ferguson
patent: 3754369 (1973-08-01), Copstead
patent: 3789889 (1974-02-01), Riedel et al.
patent: 4556091 (1985-12-01), Poulsen
patent: 4582100 (1986-04-01), Poulsen

Affiliated with

Also associated with

Rating

Apparatus for filling pressure vessels with gases, particularly does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for filling pressure vessels with gases, particularly , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for filling pressure vessels with gases, particularly will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1241926