Apparatus for fabricating thin-film semiconductor device

Details Apparatus for fabricating thin-film semiconductor device Apparatus for fabricating thin-film semiconductor device

2005-03-08

2005-03-08

Niebling, John F. (Department: 2812)

Coating apparatus

Gas or vapor deposition

With treating means

C118S715000, C118S719000

Reexamination Certificate

active

06863733

ABSTRACT:
There is provided a method of fabricating a thin-film semiconductor device, including the steps of (a) melting and recrystallizing at least a surface of a thin semiconductor film formed on a substrate, in a pressure lower than an atmospheric pressure or in inert gas atmosphere, (b) keeping the substrate in atmosphere including oxygen gas, and (c) forming an insulating film on the thin semiconductor film with the substrate being kept in a pressure lower than an atmospheric pressure or inert gas atmosphere.

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Japanese Office Action dated Dec. 4, 2001 with partial English translation.

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