Apparatus for fabricating polycrystalline silicon wafer

Details Apparatus for fabricating polycrystalline silicon wafer Apparatus for fabricating polycrystalline silicon wafer

1984-08-27

1985-05-28

Flint, Jr., J. Howard

Plastic article or earthenware shaping or treating: apparatus

Female mold and means to feed measured charge of fluent...

425425, 425435, 425447, B29C 504

Patent

active

045197644

ABSTRACT:
A method of fabricating a polycrystalline silicon wafer, which method advantageously has the steps of radially outwardly flowing molten liquid of silicon base material on the wafer forming surface of a turntable mechanism by means of centrifugal force, thereby forming a thin molten liquid layer in a prescribed atmosphere, and cooling and solidifying the same. An apparatus for fabricating the wafer is used to carry out the method with a recover tray arranged at the wafer forming surface for receiving the excessive silicon liquid scattered, and a wafer tray placed on the recovery tray, and the wafer forming surface is cooled with coolant flowing in the wafer forming mechanism. Thus, large crystalline grains can be grown on the wafer in free states with the atmosphere from the inner surfaces of the casting mold as the conventional method.

REFERENCES:
patent: 2618031 (1952-11-01), Mazer
patent: 3030668 (1962-04-01), Taylor
patent: 3290423 (1966-12-01), Hatch et al.
patent: 4026335 (1977-05-01), Willemsen
patent: 4214863 (1980-07-01), Nixon
patent: 4479769 (1984-10-01), Simioni

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