Apparatus for fabricating a semiconductor device

Details Apparatus for fabricating a semiconductor device Apparatus for fabricating a semiconductor device

2006-02-28

2006-02-28

Wells, Nikita (Department: 2881)

Radiant energy

Ion generation

Field ionization type

C438S464000, C438S460000

Reexamination Certificate

active

07005650

ABSTRACT:
An apparatus for fabricating a semiconductor device, including an ultraviolet radiation source, a lamp house body surrounding the ultraviolet radiation source, the lamp house body carrying a mirror surface, an opening provided on the lamp house body, and a vacuum chuck provided on the lamp house body so as to cover the opening, the vacuum chuck being adapted for supporting a semiconductor substrate thereon in a state that the semiconductor substrate is covered by adhesive tape, wherein the vacuum chuck is formed of a material which is substantially transparent to ultraviolet radiation produced by the ultraviolet radiation source.

REFERENCES:
patent: 4558660 (1985-12-01), Nishizawa et al.
patent: 4906011 (1990-03-01), Hiyamizu et al.
patent: 5238876 (1993-08-01), Takeuchi et al.
patent: 5273615 (1993-12-01), Asetta et al.
patent: 5332406 (1994-07-01), Takeuchi et al.
patent: 5338646 (1994-08-01), Nakayama et al.
patent: 5370709 (1994-12-01), Kobayashi
patent: 5531857 (1996-07-01), Engelsberg et al.
patent: 5534102 (1996-07-01), Kadono et al.
patent: 5578133 (1996-11-01), Sugino et al.
patent: 5622900 (1997-04-01), Smith
patent: 5641714 (1997-06-01), Yamanaka
patent: 5656093 (1997-08-01), Burkhart et al.
patent: 5733814 (1998-03-01), Flesher et al.
patent: 5759874 (1998-06-01), Okawa
patent: 5863327 (1999-01-01), Thakur
patent: 5981361 (1999-11-01), Yamada
patent: 6245646 (2001-06-01), Roberts
patent: 6259066 (2001-07-01), Touchais-Papet et al.
patent: 6344402 (2002-02-01), Sekiya
patent: 6827636 (2004-12-01), Yamada
patent: 63211644 (1988-09-01), None

Affiliated with

Also associated with

Rating

Apparatus for fabricating a semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for fabricating a semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for fabricating a semiconductor device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3674841