Apparatus for fabricating a semiconductor device

Coating apparatus – Gas or vapor deposition – With treating means

Reexamination Certificate

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Details

C118S728000, C118S724000, C156S345510, C156S345520, C206S832000, C219S444100, C219S544000

Reexamination Certificate

active

07077913

ABSTRACT:
A semiconductor fabricating apparatus having a structure, which facilitates a loading and unloading operation of wafers while having a low effect by a high temperature during a heat treatment. The semiconductor fabricating apparatus includes a plurality of ring-shaped holder having brims and recessed portions, the brims for mounting the to-be-processed wafers thereon, thereby performing the required heat treatment. A tweezer plate of a wafer loading-transferring device is inserted onto the recessed portion or taken out therefrom, and the inserted tweezer plate is ascended or descended, so that the wafer can be inserted on the brims or taken out therefrom.

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