Apparatus for externally monitoring RPM of spin rinse dryer

Details Apparatus for externally monitoring RPM of spin rinse dryer Apparatus for externally monitoring RPM of spin rinse dryer

1998-05-19

2000-06-13

Gravini, Stephen

Drying and gas or vapor contact with solids

Apparatus

With apparatus using centrifugal force

F26B 1724

Patent

active

060733616

ABSTRACT:
A system for externally monitoring the angular rotation rate of a spin rinse dryer chamber in a semiconductor fabrication facility. The system includes a spin rinse dryer comprised of a dryer housing and a chamber wall that is capable of rotating within the housing. The chamber wall defines a chamber suitable for receiving a designated wafer carrier. The dryer further includes a chamber door hinged to the housing for enclosing the chamber. The spin rinse dryer is configured to rotate the chamber when activated. A detection apparatus of the system is positioned externally to the dryer housing in proximity to the chamber. The detection apparatus is adapted to detect the angular rotation rate of a detectable marker affixed to an exterior wall of the designated wafer carrier when the designated wafer carrier is placed in the chamber and the spin rinse dryer is activated.

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patent: 5692313 (1997-12-01), Ikeda et al.
patent: 5784797 (1998-07-01), Curtis et al.
patent: 5784802 (1998-07-01), Thompson et al.

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