Apparatus for exposing periphery of an object

Optics: measuring and testing – By polarized light examination – With light attenuation

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Details

356400, 355 53, G01B 1114, G03B 2742

Patent

active

052892638

ABSTRACT:
A periphery exposing apparatus for exposing a periphery of a wafer having a curved circumferential peripheral portion and a linear portion comprises a spin chuck for rotatably supporting the wafer, a light source disposed above the spin chuck for exposing the wafer periphery, and a detector for detecting the line or portion. When the linear portion is being exposed, the light source is moved along the linear portion, rather than circularly around the periphery.

REFERENCES:
patent: 4752898 (1988-06-01), Koenig
patent: 4907035 (1990-04-01), Galburt et al.
patent: 4910549 (1990-03-01), Sugita
patent: 5028955 (1991-07-01), Hayashida et al.

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