Apparatus for exposing peripheral portion of substrate

Photocopying – Projection printing and copying cameras – Original moves continuously

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355 53, 355 68, G03B 2742, G03B 2748, G03B 2750

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active

052298116

ABSTRACT:
An exposing apparatus for exposing the periphery portion of a substrate on which resist is uniformly applied while rotating the substrate by a rotating device around a substantially central portion of the substrate, comprising: an irradiating device capable of irradiating a light beam, which is not sensed by the resist, toward the periphery portion of the resist; a light receiving device disposed to confront the irradiating device, receiving the light beam and outputting a light receipt signal in accordance with the quantity of received light; a detection device for detecting the rotational angle of the resist and outputting an angular signal; a moving device for relatively moving the light beam irradiated and the substrate in a radial direction; and a control device, wherein the substrate is disposed between the irradiating device and the light receiving device so as to shield a portion of the light beam and a control device controls the moving device in accordance with the light receipt signal and the angular signal so as to relatively move the light beam and the substrate in such a manner that the radial directional width of a region which is irradiated with the light beam is substantially constant in the periphery portion of the resist.

REFERENCES:
patent: 4899195 (1990-02-01), Gotoh
patent: 4910549 (1990-03-01), Sugita
patent: 5028955 (1991-07-01), Hayashida et al.
patent: 5061956 (1991-10-01), Takubo et al.
Patent Abstracts of Japan, vol. 7, No. 256 (P-236) (1401) Nov. 15, 1983.

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