Apparatus for exposing chemically amplified resist

Details Apparatus for exposing chemically amplified resist Apparatus for exposing chemically amplified resist

1993-03-19

1995-09-19

Duda, Kathleen

Photocopying

Projection printing and copying cameras

Step and repeat

354300, G03B 2700

Patent

active

054520525

ABSTRACT:
A method for exposing a chemically amplified resist on a semi-conductive substrate comprises the steps of removing a chemically active gas which is chemically active on the chemically amplified resist from an inside of a chamber receiving a light source, the chemically amplified resist and the semiconductor substrate, and exposing at least a part of the chemically amplified resist on the semiconductor substrate to a light from the light source means so that the chemically amplified resist reacts to the light from the light source and is prevented from reacting to the chemically active gas.

REFERENCES:
patent: 3658417 (1972-04-01), Lewis
patent: 4693779 (1987-09-01), Okuhira
patent: 4704348 (1987-11-01), Koizumi

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