Apparatus for exposing a semiconductor wafer to light including

Details Apparatus for exposing a semiconductor wafer to light including Apparatus for exposing a semiconductor wafer to light including

1994-11-18

1997-10-14

Pendegrass, Joan H.

Photocopying

Projection printing and copying cameras

Step and repeat

355 71, H01L 2130

Patent

active

056777566

ABSTRACT:
An apparatus for exposing a semiconductor wafer to light, includes a light source, a glass substrate, a mask having thereon a first pattern composed of light-impermeable material, a projection lens, and an illumination optical system for radiating light derived from the light source to said mask to thereby transfer the pattern on a semiconductor wafer. The glass substrate constitutes a part of the illumination optical system and has a plurality of second patterns which are light-permeable and each of which has a different dimension from each other. The second patterns preferably are square in shape, and also preferably a combination of squares and equilateral triangles in shape.

REFERENCES:
patent: 5264898 (1993-11-01), Kamon et al.
patent: 5452053 (1995-09-01), Nozue
M.D. Levenson et al., "Improving Resolution in Photolithography with a Phase-Shifting Mask", IEEE Transactions on Electron Devices, vol. ED-29, No. 12, Dec. 1982, pp. 1828-1836.

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