Apparatus for evaporation arc stabilization during the initial c

Details Apparatus for evaporation arc stabilization during the initial c Apparatus for evaporation arc stabilization during the initial c

1984-01-06

1985-12-17

Metz, Andrew H.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, 118 501, 118723, 427 37, 427 47, C23C 1500

Patent

active

045591253

ABSTRACT:
Apparatus and method for evaporation arc stabilization including a target having a surface of material to be evaporated; circuitry for establishing an arc on the target surface for evaporating the target material, the arc being characterized by the presence of charged particles and a cathode spot which randomly migrates over the target surface; and a confinement ring contacting and surrounding the target surface, the ring being composed of a material such as boron nitride having (a) a secondary emission ratio less than one at the mean energies of the charged particles of the arc and (b) a surface energy less than that of the evaporated target material to thereby confine the cathode spot to the target surface. The confinement ring is employed as a cover for a permeable ring to prevent migration of the cathode spot onto the permeable ring during initial clean-up of the target.

REFERENCES:
patent: 2972695 (1961-02-01), Wroe
patent: 3625848 (1971-12-01), Snaper
patent: 3783231 (1974-01-01), Sablev et al.
patent: 3793179 (1974-02-01), Sablev et al.
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patent: 4391679 (1983-07-01), Morrison
patent: 4430184 (1984-02-01), Mularie
patent: 4448659 (1984-05-01), Morrison, Jr.
Naoe et al., "Vacuum-Arc Evaporation of Ferrites and Compositions of Their Deposits," Japanese Journal of Applied Physics, vol. 10, No. 6, Jun. 1971.

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