Apparatus for etching wafer by single-wafer process and...

Details Apparatus for etching wafer by single-wafer process and... Apparatus for etching wafer by single-wafer process and...

2007-08-15

2011-11-29

Alanko, Anita (Department: 1713)

Etching a substrate: processes

Nongaseous phase etching of substrate

C216S092000

Reexamination Certificate

active

08066896

ABSTRACT:
An apparatus for etching a wafer by a single-wafer process comprises a fluid supplying device which feeds an etching fluid on a wafer, and a wafer-chuck for horizontally holding the wafer. The wafer-chuck is equipped with a gas injection device for injecting a gas to the wafer, a first fluid-aspirating device, and a second fluid-aspirating device. The etching fluid supplied on the wafer is spread by a rotation of the wafer. The etching fluid is scattered by a centrifugal force, or flows down over an edge portion of the wafer and is blown-off by the gas injected from the gas injection unit, and is aspirated by the first fluid-aspirating device or the second fluid-aspirating device.

REFERENCES:
patent: 4968375 (1990-11-01), Sato et al.
patent: 5688322 (1997-11-01), Motoda et al.
patent: 6159288 (2000-12-01), Satou et al.
patent: 6444589 (2002-09-01), Yoneya et al.
patent: 6579382 (2003-06-01), Ito
patent: 6861359 (2005-03-01), Ota et al.
patent: 7252778 (2007-08-01), Iwamoto et al.
patent: 2003/0073309 (2003-04-01), Emami
patent: 2009/0117749 (2009-05-01), Koyata et al.
patent: 2009/0181546 (2009-07-01), Katoh et al.
patent: 2009/0186488 (2009-07-01), Takeo et al.
patent: 11-289002 (1999-10-01), None
European Search Report from corresponding European Application No. EP06021737, dated Dec. 11, 2008.

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