Cleaning and liquid contact with solids – Apparatus – With plural means for supplying or applying different fluids...
Reexamination Certificate
2007-07-02
2010-11-02
Graybill, David E (Department: 2894)
Cleaning and liquid contact with solids
Apparatus
With plural means for supplying or applying different fluids...
C134S095100, C134S095300, C134S099100, C134S103300, C134S109000, C134S117000, C134S137000, C134S144000, C134S151000, C134S155000, C134S172000, C134S175000, C134S184000, C134S198000, C156S345180, C156S345210, C156S345230
Reexamination Certificate
active
07823595
ABSTRACT:
An apparatus for etching a substrate includes (a) a nozzle system including at least one nozzle through which acid solution containing at least hydrofluoric acid is sprayed onto the substrate, (b) a mover which moves at least one of the nozzle system and the substrate relative to the other in a predetermined direction in such a condition that the substrate and the nozzle system face each other, (c) a filter system which filters off particles out of the acid solution having been sprayed onto the substrate, and (d) a circulation system which circulates the acid solution having been sprayed onto the substrate, to the filter system, and further, to the nozzle system from the filter system.
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Takeuchi, K.; “High-Rate Glass Etching Process for Transferring Polycrystalline Silicon Thin-Film Transistors to Flexible Substrates”, IEEE Transactions on Semiconductor Manufacturing, vol. 18, No. 3, 2005, pp. 384-389.
Graybill David E
NEC Corporation
Scully , Scott, Murphy & Presser, P.C.
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