Apparatus for etching patterned substrates

Details Apparatus for etching patterned substrates Apparatus for etching patterned substrates

1989-04-28

1990-09-18

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156637, 156639, 156651, 156652, 156656, 1566591, 252 792, B44C 122, C23F 102, C03C 1500, C03C 2506

Patent

active

049575830

ABSTRACT:
A wet etching process wherein the etchant bath is ultrasonically vibrated, preferably while a carrier member holding the workpiece to be etched is slightly agitated. An apparatus for practicing the process includes a first vessel for holding a coupling fluid; a second vessel for holding an etchant solution; means for suspending the second vessel in the coupling fluid of the first vessel; and an ultrasonic generator means coupled to the first vessel to impart ultrasonic vibrations to the coupling fluid and, via the coupling fluid and second vessel, to the etchant solution.

REFERENCES:
patent: 3411999 (1968-11-01), Weinberg
patent: 3745079 (1973-07-01), Cowles et al.
patent: 4440594 (1984-04-01), Stearns

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