Apparatus for etching or stripping substrate of liquid...

Etching a substrate: processes – Forming or treating article containing a liquid crystal...

Reexamination Certificate

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C216S024000, C216S041000, C216S049000, C216S083000, C216S084000, C134S018000, C134S026000, C134S032000, C134S095200, C134S095300

Reexamination Certificate

active

07897056

ABSTRACT:
Disclosed are an apparatus for etching or stripping a substrate of a liquid crystal display device and a method thereof. The present invention includes carrying out an etching or stripping process on substrates using an etchant in a first etchant tank, counting a number of the substrates etched or stripped using the etchant in the first etchant tank, checking readiness of a second etchant tank at a predetermined point in time before the counted number reaches a maximum substrate number set up previously for the etchant tanks, and carrying out the etching or stripping process on the substrates using an etchant in the second etchant tank when the second etchant tank is in readiness for use and the counted number reaches the maximum substrate number.

REFERENCES:
patent: 3772105 (1973-11-01), Shipley
patent: 4359360 (1982-11-01), Harris et al.
patent: 4741798 (1988-05-01), Haas
patent: 4904339 (1990-02-01), Diehl et al.
patent: 5308447 (1994-05-01), Lewis et al.
patent: 5387313 (1995-02-01), Thoms
patent: 6203659 (2001-03-01), Shen et al.
patent: 6277204 (2001-08-01), Chang et al.
patent: 6368415 (2002-04-01), Asaoka
patent: 6446645 (2002-09-01), Doi
patent: 6495055 (2002-12-01), Lim et al.
patent: 6497240 (2002-12-01), Kobayashi et al.
patent: 6564421 (2003-05-01), Park et al.
patent: 6578588 (2003-06-01), Park, II
patent: 2002/0050322 (2002-05-01), Kunisawa et al.
patent: 2003/0159718 (2003-08-01), Kamikawa et al.
Tseng, Bob H.P. et al “A Novel Design for the Construction and Startup of an Eight Inch Pilot Line” IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 1992, pp. 60-65.

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