Apparatus for etching discs and pallets prior to sputter deposit

Details Apparatus for etching discs and pallets prior to sputter deposit Apparatus for etching discs and pallets prior to sputter deposit

1999-06-23

2000-12-05

Mills, Gregory

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723MR, 118723MA, C23F 112

Patent

active

061561541

ABSTRACT:
Embodiments of the invention are directed to an etching apparatus for removing impurities from the surface of a substrate, such as a pallet and disc. Embodiments of the etching apparatus comprise a magnetic source, a cleaning chamber, a substrate transportation mechanism and a power source. The magnetic source is placed within the cleaning chamber, or vacuum chamber, which is configured to bombard the magnetic source with plasma. The substrate transportation mechanism resides within the cleaning chamber and is used to pull the pallet through the chamber between the spacing between the magnet towers. The power source, which is a DC source, is coupled to the pallet and produces an electric field which ionizes the plasma.

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