Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1997-10-20
1999-07-13
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419211, 20429836, 20419234, C23C 1434
Patent
active
059221798
ABSTRACT:
An apparatus and process for the etching and coating of samples in a single vacuum chamber, thus minimizing handling and transfer of the samples is provided. The apparatus includes a sealed chamber and a vacuum pump for forming and maintaining a vacuum in the chamber, a first ion gun positioned in the chamber to etch a sample, a sputtering target in the chamber, and at least one additional ion gun positioned in the chamber to cause material from the target to be directed onto the sample.
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Alani Reza
Malaszewski Leszek
Mitro Richard J.
Cantelmo Gregg
Gatan Inc.
Nguyen Nam
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